ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,477,690, issued on Nov. 18, was assigned to Jentech Precision Industrial Co. LTD. (Taoyuan, Taiwan).
"Method for manufacturing vapor chamber" was invented by Chun-Ta Yeh (Taoyuan, Taiwan) and Chin-Long Lin (Taoyuan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a vapor chamber includes forming a base plate by forging. The base plate includes a plate body, a peripheral frame and some pillars separated from each other and surrounded by the peripheral frame. The surface and the peripheral frame define a space. The method includes abutting a top plate against the peripheral frame and the pillars to seal up the space to for...