US Patent Issued to Jentech Precision Industrial on Dec. 9 for "Vapor chamber lid and manufacturing method thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,495,525, issued on Dec. 9, was assigned to Jentech Precision Industrial Co. LTD. (Taoyuan, Taiwan).

"Vapor chamber lid and manufacturing method thereof" was invented by Chun-Ta Yeh (Taoyuan, Taiwan), Chin-Hung Kuo (Taoyuan, Taiwan) and Po-Li Wang (Taoyuan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure is related to a vapor chamber lid. The vapor chamber lid includes a base plate and a top plate. The base plate includes a plate body, a frame, a plurality of supporting pillars and a chip accommodating portion. The frame surrounds the plate body to define a cooling space. The cooling space is configured to accommodate a workin...