ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,487,082, issued on Dec. 2, was assigned to JEL Corp. (Japan).
"Method for positioning substrate" was invented by Tsuyoshi Kobayashi (Hiroshima, Japan), Toru Yuki (Hiroshima, Japan) and Kisato Hirata (Hiroshima, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for adjusting a position of a substrate, includes: acquiring primary positional data indicating the positions of the edge portions (S31); acquiring secondary positional data indicating the positions of the edge portions after a stage has been moved (S33); calculating, using the primary positional data and the secondary positional data, difference amounts between the positions of the edg...