ALEXANDRIA, Va., June 16 -- United States Patent no. 12,305,081, issued on May 20, was assigned to JAPAN VAM & POVAL Co. LTD. (Osaka, Japan).
"Polishing composition" was invented by Takashi Murakami (Osaka, Japan) and Yoshihiro Kimura (Osaka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a novel polishing composition. The polishing composition comprises a water-soluble polymer at least comprising a vinyl alcohol-based resin having a side-chain group of 3 carbon atoms or more."
The patent was filed on Jan. 22, 2021, under Application No. 17/793,260.
*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOF...