US Patent Issued to JAEWON INDUSTRIAL on Oct. 28 for "Method for purifying an alkylene glycol monoalkyl ether carboxylic acid ester having high-purity used in photo resist process" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,454,505, issued on Oct. 28, was assigned to JAEWON INDUSTRIAL Co. LTD (Yeosu-si, South Korea).

"Method for purifying an alkylene glycol monoalkyl ether carboxylic acid ester having high-purity used in photo resist process" was invented by Sung Won Shim (Yeosu-si, South Korea), Byung Ki Son (Daejeon, South Korea), Hwan Choi (Yeosu-si, South Korea), Youn Soo Shin (Yeosu-si, South Korea), Hwa Yeong Choi (Yeosu-si, South Korea) and Ho Jeong (Jeollanam-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method for purifying an alkylene glycol monoalkyl ether carboxylic acid ester (AGAECE) for photoresist processing, wherein the metho...