US Patent Issued to JAEWON INDUSTRIAL on Dec. 30 for "Purification method of high purity isopropyl alcohol used in semiconductor cleaning process" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,509,651, issued on Dec. 30, was assigned to JAEWON INDUSTRIAL Co. LTD (Jeollanam-do, South Korea).

"Purification method of high purity isopropyl alcohol used in semiconductor cleaning process" was invented by Sung Won Shim (Jeollanam-do, South Korea), Byung Ki Son (Daejeon, South Korea), Yung Lim (Seoul, South Korea), Hwan Choi (Jeollanam-do, South Korea), Youn Soo Shin (Jeollanam-do, South Korea), Min Young Kim (Jeollanam-do, South Korea) and Tae Gi Choi (Jeollanam-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a method for purifying highly pure isopropyl alcohol used in a semiconductor cleaning process, diacetone alcohol present in ...