ALEXANDRIA, Va., March 19 -- United States Patent no. 12,252,468, issued on March 18, was assigned to JAEWON INDUSTRIAL Co. LTD (Jeollanam-do, South Korea) and EM TECH. Co. LTD (Chungcheongnam-do, South Korea).
"Method for purifying waste N-methyl-2-pyrrolidone mixture solution" was invented by Sung Won Shim (Jeollanam-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for purifying a waste N-methyl-2-pyrrolidone (NMP) mixed solution according to an embodiment of the present disclosure includes using a base. The base according to an embodiment may be NaBH4. N-methylsuccinimide and Gamma-butyrolactone are simultaneously removed, and high-purity NMP can be recovered by applying a base to t...