ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,496,733, issued on Dec. 16, was assigned to JABIL INC..
"Apparatus, system and method for providing an end effector" was invented by Jeroen Bosboom (St. Petersburg, Fla.), Babak Naderi (St. Petersburg, Fla.), Richard Munro (St. Petersburg, Fla.) and Tatiana Pankova Major (St. Petersburg, Fla.).
According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosure provides an apparatus, system and method for providing an end effector. The end effector may be capable of accommodating semiconductor wafers of varying sizes, and may include: a wafer support; a bearing arm capable of interfacing with at least one robotic element, and at least partially bearing the wafe...