ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,381,110, issued on Aug. 5, was assigned to JABIL INC..
"Apparatus, system and method for providing a substrate chuck" was invented by Jeroen Bosboom (St. Petersburg, Fla.).
According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus, system and method for providing a stationary chuck for positionally maintaining an associated in-process wafer. The stationary chuck may include a base plate having, on an upper surface thereof, a plurality of machined concentric ridges that form a series of concentric circular zones; a silicon carbide coating on the upper surface of the base plate; and a plurality of silicon carbide inlays capable of being bonded onto the sil...