US Patent Issued to ISR on Oct. 21 for "Photosensitive resin composition, method for producing resist pattern film, and method for producing plated formed product" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,449,731, issued on Oct. 21, was assigned to ISR Corp. (Tokyo).

"Photosensitive resin composition, method for producing resist pattern film, and method for producing plated formed product" was invented by Naoki Nishiguchi (Tokyo), Tomoyuki Matsumoto (Tokyo), Akira Ishii (Tokyo) and Ayako Endo (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photosensitive resin composition contains at least one compound selected from the group consisting of compound (C1) represented by formula (C1), compound (C2) represented by formula (C2), and a multimer of the compound (C2). Z each independently represents an oxygen atom or a sulfur atom. R31 each independently...