US Patent Issued to ISHIHARA CHEMICAL on Oct. 21 for "Treatment method after plating with Sn or Sn alloy" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,448,690, issued on Oct. 21, was assigned to ISHIHARA CHEMICAL Co. LTD. (Kobe, Japan).

"Treatment method after plating with Sn or Sn alloy" was invented by Masaru Hatabe (Kobe, Japan), Akihiro Yoshizawa (Kobe, Japan) and Takahiro Tanaka (Kobe, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A treatment method is for preventing compound contaminations derived from Sn or an Sn alloy, which have precipitated on members, such as a substrate and a conveyance tool, from accumulating after plating with Sn or the Sn alloy. The method includes washing at least one of the members used in a series of plating treatment steps with an acidic solution immediately ...