US Patent Issued to ISAC RESEARCH on Aug. 19 for "Powder atomic layer deposition equipment and gas supply method therefor" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,392,035, issued on Aug. 19, was assigned to ISAC RESEARCH INC. (Daejeon, South Korea).

"Powder atomic layer deposition equipment and gas supply method therefor" was invented by Chae Woong Kim (Daejeon, South Korea), Su Han Song (Daejeon, South Korea) and Hyung Sang Park (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are powder atomic layer deposition (ALD) equipment capable of increasing deposition uniformity of powder by using a gas supply sequence with or without an impeller or a vibration generator, and a gas supply method thereof, the powder ALD equipment including a process chamber having an accommodation space therein ...