ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,479,718, issued on Nov. 25, was assigned to InvenSense Inc. (San Jose, Calif.).
"Actuator layer patterning with topography" was invented by Daesung Lee (San Jose, Calif.) and Alan Cuthbertson (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method including fusion bonding a handle wafer to a first side of a device wafer. The method further includes depositing a hardmask on a second side of the device wafer, wherein the second side is planar. An etch stop layer is deposited over the hardmask and an exposed portion of the second side of the device wafer. A dielectric layer is formed over the etch stop layer. A via is formed within the di...