US Patent Issued to International Business Machines on Oct. 28 for "Method for forming continuous line-end to line-end spaces with spacer assisted lithography-etch-lithography etch processes" (New York Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,455,505, issued on Oct. 28, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Method for forming continuous line-end to line-end spaces with spacer assisted lithography-etch-lithography etch processes" was invented by Allen Gabor (Katonah, N.Y.) and Geng Han (Niskayuna, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Method and apparatus for improved and efficient spacer assisted lithography-etch-lithography etch (SALELE) processes that utilize a spin-on-material layer, where the spin-on-material layer fills gaps between spacers to protect line-end to line-end spaces created by a cut shape. The method and structures also include...