US Patent Issued to International Business Machines on Nov. 18 for "Self-aligned gate isolation for multi-directional gate layouts in quantum and semiconductor devices" (Swiss Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,477,812, issued on Nov. 18, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Self-aligned gate isolation for multi-directional gate layouts in quantum and semiconductor devices" was invented by Konstantinos Tsoukalas (Zurich), Patrick Harvey-Collard (Zurich), Andreas Fuhrer Janett (Zurich), Felix Julian Schupp (Zurich) and Matthias Mergenthaler (Zurich).

According to the abstract* released by the U.S. Patent & Trademark Office: "One embodiment of the invention provides a method for fabricating a self-aligned gate structure comprising forming at least one first trench having a first width and at least one second trench having a second width in a gate structure co...