US Patent Issued to International Business Machines on May 20 for "Late replacement bottom isolation for nanosheet devices" (New York Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,310,054, issued on May 20, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Late replacement bottom isolation for nanosheet devices" was invented by Ruilong Xie (Niskayuna, N.Y.), Andrew M. Greene (Slingerlands, N.Y.), Julien Frougier (Albany, N.Y.) and Veeraraghavan S. Basker (Schenectady, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments are disclosed for a system. The system includes a semiconductor structure. The semiconductor structure includes a dielectric liner that wraps around a top and one side of a substrate island. The dielectric liner separates a substrate from a gate stack. Further, the system includes a...