US Patent Issued to International Business Machines on July 29 for "Electronic devices with a low dielectric constant" (New York Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,374,615, issued on July 29, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Electronic devices with a low dielectric constant" was invented by Hsueh-Chung Chen (Cohoes, N.Y.), Su Chen Fan (Cohoes, N.Y.), Dechao Guo (Niskayuna, N.Y.), Carl Radens (LaGrangeville, N.Y.) and Indira Seshadri (Niskayuna, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An interconnect layer for a device and methods for fabricating the interconnect layer are provided. The interconnect layer includes first metal structures arranged in a first array in the interconnect layer and second metal structures, arranged in a second array in the interconnect lay...