ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,438,080, issued on Oct. 7, was assigned to Intel Corp. (Santa Clara, Calif.).
"And process for a precision resistor" was invented by Sagar Suthram (Portland, Ore.), Seung-June Choi (Portland, Ore.), Vishal Javvaji (Hillsboro, Ore.), Soumya Kar (Hillsboro, Ore.), Ahmed Esmail (Hillsboro, Ore.) and Gokul Malyavanatham (Hillsboro, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure is disclosed. The semiconductor structure includes back end layers that include a first metallization layer, a second metallization layer, and a scalable resistor between the first metallization layer and the second metallization layer. The semiconductor...