ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,457,771, issued on Oct. 28, was assigned to Intel Corp. (Santa Clara, Calif.).
"Plug and recess process for dual metal gate on stacked nanoribbon devices" was invented by Nicole Thomas (Portland, Ore.), Michael K. Harper (Hillsboro, Ore.), Leonard P. Guler (Hillsboro, Ore.), Marko Radosavljevic (Portland, Ore.) and Thoe Michaelos (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments disclosed herein include semiconductor devices and methods of making such devices. In an embodiment, the semiconductor device comprises a plurality of stacked semiconductor channels comprising first semiconductor channels and second semiconductor channel...