ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,678, issued on Oct. 14, was assigned to Intel Corp. (Santa Clara, Calif.).
"Spacer-based self-aligned interconnect features" was invented by Moshe Dolejsi (Portland, Ore.), Travis W. Lajoie (Forest Grove, Ore.) and Abhishek Anil Sharma (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "An integrated circuit includes a first conductive structure, a second conductive structure, and a first spacer and a second spacer each comprising a first dielectric material. The integrated circuit further includes a layer comprising a second dielectric material that is compositionally different from the first dielectric material. The integrated circuit f...