ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,484,281, issued on Nov. 25, was assigned to Intel Corp. (Santa Clara, Calif.).
"Topside plugs for epitaxial contact formation" was invented by Leonard P. Guler (Hillsboro, Ore.), Nikhil J. Mehta (Portland, Ore.), Krishna Ganesan (Portland, Ore.), Chanaka D. Munasinghe (Portland, Ore.), Tahir Ghani (Portland, Ore.) and Charles H. Wallace (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Techniques are provided herein to form semiconductor devices that use uniform topside dielectric plugs as masking structures to form conductive contacts to various source or drain regions. In an example, a plurality of semiconductor devices each include one o...