US Patent Issued to Intel on Nov. 25 for "Gate-all-around integrated circuit structures having underlying dopant-diffusion blocking layers" (Oregon Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,484,266, issued on Nov. 25, was assigned to Intel Corp. (Santa Clara, Calif.).

"Gate-all-around integrated circuit structures having underlying dopant-diffusion blocking layers" was invented by Glenn Glass (Portland, Ore.), Anand Murthy (Portland, Ore.), Biswajeet Guha (Hillsboro, Ore.), Dax Crum (Beaverton, Ore.), Patrick Keys (Portland, Ore.), Tahir Ghani (Portland, Ore.), Susmita Ghose (Hillsboro, Ore.) and Ted Cook Jr. (Hillsboro, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Gate-all-around integrated circuit structures having underlying dopant-diffusion blocking layers are described. For example, an integrated circuit structure includes a ve...