US Patent Issued to Intel on Nov. 11 for "Contact over active gate structures with uniform and conformal gate insulating cap layers for advanced integrated circuit structure fabrication" (Oregon Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,471,349, issued on Nov. 11, was assigned to Intel Corp. (Santa Clara, Calif.).

"Contact over active gate structures with uniform and conformal gate insulating cap layers for advanced integrated circuit structure fabrication" was invented by Leonard P. Guler (Hillsboro, Ore.), Chanaka D. Munasinghe (Portland, Ore.), Charles H. Wallace (Portland, Ore.), Tahir Ghani (Portland, Ore.) and Krishna Ganesan (Portland, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Contact over active gate (COAG) structures with uniform and conformal gate insulating cap layers, and methods of fabricating contact over active gate (COAG) structures using uniform and conformal...