ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,805, issued on May 27, was assigned to Intel Corp. (Santa Clara, Calif.).
"Self-aligned lateral contacts" was invented by Andy Chih-Hung Wei (Yamhill, Ore.), Yang-Chun Cheng (Portland, Ore.), Shaestagir Chowdhury (Portland, Ore.) and Guillaume Bouche (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Techniques to form self-aligned lateral contacts. In an example, a first trench contact contacts a source or drain region of a transistor. A second trench contact includes non-contiguous first and second portions, each portion having a top surface that is co-planar with a top surface of the first trench contact as well as a top surface of th...