US Patent Issued to Intel on May 27 for "Adjacent gate-all-around integrated circuit structures having non-merged epitaxial source or drain regions" (Oregon Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,317,585, issued on May 27, was assigned to Intel Corp. (Santa Clara, Calif.).

"Adjacent gate-all-around integrated circuit structures having non-merged epitaxial source or drain regions" was invented by Sairam Subramanian (Portland, Ore.), Walid M. Hafez (Portland, Ore.), Hsu-Yu Chang (Hillsboro, Ore.), Chia-Hong Jan (Portland, Ore.) and Tanuj Trivedi (Hillsboro, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Adjacent gate-all-around integrated circuit structures having non-merged epitaxial source or drain regions, and methods of fabricating adjacent gate-all-around integrated circuit structures having non-merged epitaxial source or drain regions, ...