US Patent Issued to Intel on May 20 for "Deep geometric model fitting" (American, German Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,307,579, issued on May 20, was assigned to Intel Corp. (Santa Clara, Calif.).

"Deep geometric model fitting" was invented by Rene Ranftl (Munich) and Vladlen Koltun (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems, apparatuses and methods may provide for technology that generates, by a first neural network, an initial set of model weights based on input data and iteratively generates, by a second neural network, an updated set of model weights based on residual data associated with the initial set of model weights and the input data. Additionally, the technology may output a geometric model of the input data based on the updat...