US Patent Issued to Intel on May 13 for "Material deposition method and material deposition apparatus" (Arizona Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,296,360, issued on May 13, was assigned to Intel Corp. (Santa Clara, Calif.).

"Material deposition method and material deposition apparatus" was invented by Fanyi Zhu (Chandler, Ariz.) and Hanyu Song (Chandler, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "There may be provided a material deposition method and a material deposition apparatus. The method may include providing a substrate. The method may further include providing a layer of a material in a solid form onto the substrate. The material in the solid form may be loosely interfacing with the substrate. The method may further include irradiating the material in a solid form with a light t...