ALEXANDRIA, Va., March 19 -- United States Patent no. 12,255,247, issued on March 18, was assigned to Intel Corp. (Santa Clara, Calif.).
"Trench contact structures for advanced integrated circuit structure fabrication" was invented by Subhash M. Joshi (Hillsboro, Ore.), Jeffrey S. Leib (Beaverton, Ore.) and Michael L. Hattendorf (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the disclosure are in the field of advanced integrated circuit structure fabrication and, in particular, 10 nanometer node and smaller integrated circuit structure fabrication and the resulting structures. In an example, an integrated circuit structure includes a fin. A gate dielectric layer is over the top...