US Patent Issued to Intel on June 24 for "Neighboring gate-all-around integrated circuit structures having disjoined epitaxial source or drain regions" (Oregon Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,342,612, issued on June 24, was assigned to Intel Corp. (Santa Clara, Calif.).

"Neighboring gate-all-around integrated circuit structures having disjoined epitaxial source or drain regions" was invented by Leonard P. Guler (Hillsboro, Ore.), Biswajeet Guha (Hillsboro, Ore.), Tahir Ghani (Portland, Ore.) and Swaminathan Sivakumar (Beaverton, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Neighboring gate-all-around integrated circuit structures having disjoined epitaxial source or drain regions, and methods of fabricating neighboring gate-all-around integrated circuit structures having disjoined epitaxial source or drain regions, are described. For ...