US Patent Issued to Intel on June 10 for "Integrated circuit structures with gate cuts above buried power rails" (Oregon Inventor)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,791, issued on June 10, was assigned to Intel Corp. (Santa Clara, Calif.).

"Integrated circuit structures with gate cuts above buried power rails" was invented by Andy Chih-Hung Wei (Yamhill, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An example IC structure includes a plurality of elongated channel structures (e.g., fins or nanoribbons) and one or more metal gate lines crossing over the fins/nanoribbons. A buried power rail (BPR) is formed between a pair of adjacent fins/nanoribbons. Once a BPR has been formed, an opening is formed above the BPR. The opening has an elongated shape that extends horizontally along the length of the BPR and e...