US Patent Issued to Intel on June 10 for "Gate spacing in integrated circuit structures" (Oregon Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,328,936, issued on June 10, was assigned to Intel Corp. (Santa Clara, Calif.).

"Gate spacing in integrated circuit structures" was invented by Guillaume Bouche (Portland, Ore.), Andy Chih-Hung Wei (Yamhill, Ore.) and Sean T. Ma (Portland, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Discussed herein is gate spacing in integrated circuit (IC) structures, as well as related methods and components. For example, in some embodiments, an IC structure may include: a first gate metal having a longitudinal axis; a second gate metal, wherein the longitudinal axis of the first gate metal is aligned with a longitudinal axis of the second gate metal; a first ...