US Patent Issued to Intel on July 29 for "Machine learning-based scatterometry and feed forward techniques for gate-all-around transistors" (Oregon Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,374,570, issued on July 29, was assigned to Intel Corp. (Santa Clara, Calif.).

"Machine learning-based scatterometry and feed forward techniques for gate-all-around transistors" was invented by Deepak Verma (Hillsboro, Ore.), Navnit Agarwal (Portland, Ore.) and Ayan Das (Beaverton, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "This disclosure describes systems, methods, and devices for estimating dimple etch recess depth in a gate-all-around transistor. A method may include receiving, by a device, first measurements of the gate-all-around transistor, the first measurements based on first optical data from a spacer etch stage of fabricating the gat...