ALEXANDRIA, Va., July 16 -- United States Patent no. 12,364,001, issued on July 15, was assigned to Intel Corp. (Santa Clara, Calif.).
"Integrated circuit structures with backside gate partial cut or trench contact partial cut" was invented by Leonard P. Guler (Hillsboro, Ore.), Mohammad Hasan (Aloha, Ore.), Charles H. Wallace (Portland, Ore.) and Tahir Ghani (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Integrated circuit structures having backside gate partial cut or backside trench contact partial cut and/or spit epitaxial structure are described. For example, an integrated circuit structure includes a first sub-fin structure over a first stack of nanowires. A second sub-fin structure is ...