US Patent Issued to Intel on Feb. 17 for "Spacer self-aligned via structures using directed self assembly for gate contact or trench contact" (Oregon Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,557,625, issued on Feb. 17, was assigned to Intel Corp. (Santa Clara, Calif.).

"Spacer self-aligned via structures using directed self assembly for gate contact or trench contact" was invented by Leonard P. Guler (Hillsboro, Ore.), Tahir Ghani (Portland, Ore.), Charles H. Wallace (Portland, Ore.) and Gurpreet Singh (Beaverton, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Spacer self-aligned via structures for gate contact or trench contact are described. In an example, an integrated circuit structure includes a plurality of gate structures above a substrate. A plurality of conductive trench contact structures is alternating with the plurality of ...