ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,490,462, issued on Dec. 2, was assigned to Intel Corp. (Santa Clara, Calif.).
"Angled gate or diffusion plugs" was invented by Leonard P. Guler (Hillsboro, Ore.), Tsuan-Chung Chang (Portland, Ore.), Charles H. Wallace (Portland, Ore.), Peter P. Sun (Hillsboro, Ore.), Tahir Ghani (Portland, Ore.) and Virupaxi Goornavar (Hillsboro, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Techniques are provided herein to form an integrated circuit having gate cut structures or plug structures between source or drain regions, with an angled cut made to the top portion of the structures. In an example, a semiconductor device includes a semiconductor region extend...