ALEXANDRIA, Va., April 9 -- United States Patent no. 12,272,737, issued on April 8, was assigned to Intel Corp. (Santa Clara, Calif.).
"Gate-all-around integrated circuit structures having adjacent structures for sub-fin electrical contact" was invented by Biswajeet Guha (Hillsboro, Ore.), William Hsu (Hillsboro, Ore.), Chung-Hsun Lin (Portland, Ore.), Kinyip Phoa (Beaverton, Ore.), Oleg Golonzka (Beaverton, Ore.) and Tahir Ghani (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Gate-all-around integrated circuit structures having adjacent structures for sub-fin electrical contact are described. For example, an integrated circuit structure includes a semiconductor island on a semiconductor subst...