ALEXANDRIA, Va., June 5 -- United States Patent no. 12,278,204, issued on April 15, was assigned to Intel Corp. (Santa Clara, Calif.).
"Pattern decomposition lithography techniques" was invented by Charles H. Wallace (Portland, Ore.), Hossam A. Abdallah (Portland, Ore.), Elliot N. Tan (Portland, Ore.), Swaminathan Sivakumar (Portland, Ore.), Oleg Golonzka (Beaverton, Ore.) and Robert M. Bigwood (Hillsboro, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Techniques are disclosed for realizing a two-dimensional target lithography feature/pattern by decomposing (splitting) it into multiple unidirectional target features that, when aggregated, substantially (e.g., fully) represent the original target feature...