US Patent Issued to Intel Coporation on June 10 for "Low resistance and reduced reactivity approaches for fabricating contacts and the resulting structures" (Oregon Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,328,927, issued on June 10, was assigned to Intel Coporation (Santa Clara, Calif.).

"Low resistance and reduced reactivity approaches for fabricating contacts and the resulting structures" was invented by Gilbert Dewey (Beaverton, Ore.), Nazila Haratipour (Hillsboro, Ore.), Siddharth Chouksey (Portland, Ore.), Arnab Sen Gupta (Hillsboro, Ore.), Christopher J. Jezewski (Portland, Ore.), I-Cheng Tung (Hillsboro, Ore.), Matthew V. Metz (Portland, Ore.) and Anand S. Murthy (Portland, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Low resistance and reduced reactivity approaches for fabricating contacts, and semiconductor structures having low resistanc...