US Patent Issued to Institute of Microelectronics, Chinese Academy of Sciences on Feb. 3 for "Optical method and apparatus for quickly realizing precise calibration of lithography system" (Chinese Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,541,154, issued on Feb. 3, was assigned to Institute of Microelectronics, Chinese Academy of Sciences (Beijing).

"Optical method and apparatus for quickly realizing precise calibration of lithography system" was invented by Dandan Han (Beijing) and Yayi Wei (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for fast precise optical calibration on a photolithography system, including: determining a fitting relationship for a spot width corresponding to a point light source based on distribution of field strength generated by the point light source at an exit plane of a focusing element; determining, based on the fitting relationship, a first...