US Patent Issued to Inpria on Sept. 16 for "Organometallic photoresist developer compositions and processing methods" (Oregon Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,861, issued on Sept. 16, was assigned to Inpria Corp. (Corvallis, Ore.).

"Organometallic photoresist developer compositions and processing methods" was invented by Kai Jiang (Corvallis, Ore.), Brian J. Cardineau (Corvallis, Ore.), Lauren B. McQuade (Albany, Ore.), Jeremy T. Anderson (Corvallis, Ore.), Stephen T. Meyers (Corvallis, Ore.), Michael Kocsis (Albany, Ore.) and Amrit K. Narasimhan (Corvallis, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Developer compositions are described based on blends of solvents, in which the developers are particularly effective for EUV patterning using organometallic based patterning compositions. Methods fo...