US Patent Issued to Inpria on July 15 for "Stabilized interfaces of inorganic radiation patterning compositions on substrates" (Belgian, American Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,360,454, issued on July 15, was assigned to Inpria Corp. (Corvallis, Ore.).

"Stabilized interfaces of inorganic radiation patterning compositions on substrates" was invented by Brian J. Cardineau (Corvallis, Ore.), Shu-Hao Chang (Leuven, Belgium), Jason K. Stowers (Corvallis, Ore.), Michael Kocsis (Albany, Ore.) and Peter de Schepper (Wijnegem, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method is described for stabilizing organometallic coating interfaces through the use of multilayer structures that incorporate an underlayer coating. The underlayer is composed of an organic polymer that has crosslinking and adhesion-promoting functional g...