ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,554,195, issued on Feb. 17, was assigned to Inpria Corp. (Corvallis, Ore.).
"Radiation based patterning methods" was invented by Jason K. Stowers (Corvallis, Ore.), Alan J. Telecky (Albany, Ore.), Douglas A. Keszler (Corvallis, Ore.) and Andrew Grenville (Corvallis, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Stabilized precursor solutions can be used to form radiation inorganic coating materials. The precursor solutions generally comprise metal suboxide cations, peroxide-based ligands and polyatomic anions. Design of the precursor solutions can be performed to achieve a high level of stability of the precursor solutions. The resulting coating m...