US Patent Issued to Inpria on Dec. 2 for "Organometallic solution based high resolution patterning compositions and corresponding methods" (Oregon Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,487,522, issued on Dec. 2, was assigned to Inpria Corp. (Corvallis, Ore.).

"Organometallic solution based high resolution patterning compositions and corresponding methods" was invented by Stephen T. Meyers (Corvallis, Ore.), Jeremy T. Anderson (Corvallis, Ore.), Joseph B. Edson (Corvallis, Ore.), Kai Jiang (Corvallis, Ore.), Douglas A. Keszler (Corvallis, Ore.), Michael K. Kocsis (Albany, Ore.), Alan J. Telecky (Albany, Ore.) and Brian J. Cardineau (Corvallis, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Organometallic radiation resist compositions are described based on tin ions with alkyl ligands. Some of the compositions have branched alkyl li...