ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,399,426, issued on Aug. 26, was assigned to Inpria Corp. (Corvallis, Ore.).
"Patterned organometallic photoresists and methods of patterning" was invented by Michael Kocsis (Albany, Ore.), Peter De Schepper (Wijnegem, Belgium), Michael Greer (Corvallis, Ore.) and Shu-Hao Chang (Leuven, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "A rinse process is described for processing an initially patterned structure formed with an organometallic radiation sensitive material, in which the rinse process can remove portions of the composition remaining after pattern development to make the patterned structure more uniform such that a greater fraction of pat...