ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,498,641, issued on Dec. 16, was assigned to Inpria Corp. (Corvallis, Ore.) and Tokyo Electron Ltd. (Tokyo).
"Process environment for inorganic resist patterning" was invented by Alan J. Telecky (Albany, Ore.), Jason K. Stowers (Corvallis, Ore.), Douglas A. Keszler (Corvallis, Ore.), Stephen T. Meyers (Corvallis, Ore.), Peter De Schepper (Wijnegem, Belgium), Sonia Castellanos Ortega (Leuven, Belgium), Michael Greer (Corvallis, Ore.) and Kirsten Louthan (Philomath, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing ...