US Patent Issued to Innolux, CARUX TECHNOLOGY on Dec. 30 for "Deposition apparatus and deposition method" (Taiwanese Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,509,761, issued on Dec. 30, was assigned to Innolux Corp. (Miaoli County, Taiwan) and CARUX TECHNOLOGY PTE. LTD. (Singapore).

"Deposition apparatus and deposition method" was invented by Cheng-Wei Liu (New District, Taiwan) and Liang-Cheng Ma (Miao-Li County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A deposition apparatus is provided, including a deposition chamber, at least one target, at least one substrate holder, and at least one adjustment plate. The at least one target, the at least one substrate holder, and the at least one adjustment plate are disposed in the deposition chamber, and the at least one adjustment plate is disposed betw...