US Patent Issued to INFOVION on Feb. 3 for "Electron-beam-assisted sputtering device and method therefor" (South Korean Inventor)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,540,386, issued on Feb. 3, was assigned to INFOVION INC. (Bucheon-si, South Korea).

"Electron-beam-assisted sputtering device and method therefor" was invented by Yong Hwan Kim (Goyang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides an electron-beam-assisted sputtering device and a method therefor, the device adding, as an electron supply means, an electron beam supply module to a conventional plasma sputtering device, so as to lower the process pressure of sputtering, thereby improving the quality of a deposition thin film. The electron-beam-assisted sputtering device of the present disclosure comprises: a ...