US Patent Issued to INDUSTRY FOUNDATION OF CHONNAM NATIONAL UNIVERSITY on Oct. 21 for "Nano-patterend conductive polymer substrate with improved cell alignment, maturity, adhesion, and connectivity and method for manufacturing same" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,448,491, issued on Oct. 21, was assigned to INDUSTRY FOUNDATION OF CHONNAM NATIONAL UNIVERSITY (Gwangju, South Korea).

"Nano-patterend conductive polymer substrate with improved cell alignment, maturity, adhesion, and connectivity and method for manufacturing same" was invented by Dong Weon Lee (Gwangju, South Korea) and Yuyan Liu (Gwangju, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a conductive polymer substrate and a method for manufacturing the same, wherein the conductive polymer substrate has improved cell alignment, maturity, adhesion, and connectivity by having nanopatterns on a surface thereof while having electric ...