US Patent Issued to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE on Sept. 16 for "Anhydride compound, polyimide, and thin film" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,415,893, issued on Sept. 16, was assigned to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Hsinchu, Taiwan).

"Anhydride compound, polyimide, and thin film" was invented by Yi-Syuan Wang (Taoyuan, Taiwan), Jeng-Yu Tsai (Chiayi, Taiwan), Chi-En Kuan (Zhudong Township, Taiwan), Jyh-Long Jeng (New Taipei, Taiwan), Chih-Ming Hu (Hsinchu, Taiwan) and Chen-Hsi Cheng (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An anhydride compound, polyimide, and thin film are provided. The anhydride compound has a chemical structure ofwherein R1 iseach of R4 is independently C1-6 alkylene group, m is an integer of 0 to 10, and m' is an integer of 1 to 10; n i...