US Patent Issued to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE on March 25 for "Inspection method and inspection platform for lithography" (Taiwanese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,660, issued on March 25, was assigned to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Hsinchu, Taiwan).

"Inspection method and inspection platform for lithography" was invented by Cheng-Hsien Chen (Taoyuan, Taiwan), Shu-Chun Liao (Hsinchu, Taiwan), Shau-Wei Hsu (Hsinchu County, Taiwan), Wei-En Fu (Taoyuan, Taiwan), Tsung-Ying Chung (Hsinchu, Taiwan) and Yi-Chen Chuang (Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An inspection method and an inspection platform applicable for inspecting a light source used to expose a substrate. The light source is adapted to form an illuminated area on a surface of the substrate. The inspection method...